Selected for NEDO's "Research and Development Project of the Enhanced Infrastructures for Post-5G Information and Communication Systems / Development of Manufacturing Technologies for Advanced Semiconductors (Subsidy)"
Nikon Begins Development of Digital Lithography System with 0.5 μm (L/S) Resolution
Tuesday, October 20, 2026
Nikon Corporation is pleased to announce that it has been selected for the "Research and Development Project of the Enhanced Infrastructures for Post-5G Information and Communication Systems / Development of Manufacturing Technologies for Advanced Semiconductors (Subsidy)" conducted by the New Energy and Industrial Technology Development Organization (NEDO) for its newly launched development of a digital lithography system capable of achieving 0.5 �m *1 (L/S)*2 resolution.
This project aims to develop the core technologies that will underpin information and communication systems supporting the post-5G era. Through these efforts, it seeks to strengthen the development and manufacturing foundations of post-5G information and communication systems while simultaneously achieving both a digital society and decarbonization. NEDO has selected Nikon�s proposal to develop a high-resolution digital lithography system for advanced packaging, submitted under the topic of �large-area, high-precision exposure system development� for advanced semiconductor manufacturing equipment.
Development of high-performance semiconductor devices is accelerating in order to address challenges such as growing data volumes driven by the widespread adoption of post-5G � a next-generation communications technology � and AI, as well as the need to reduce the associated power consumption. Technological innovation is currently advancing in the back-end semiconductor device manufacturing process (advanced packaging). In panel-level packaging, exposure technology capable of forming high-resolution, high-density redistribution layers (RDL) on large substrates is becoming increasingly important.
In its current Medium-Term Management Plan, Nikon has identified digital lithography systems as one of its focus areas. To date, the company has developed digital lithography systems with resolutions of 1.0 �m and 1.5 �m (L/S) and overlay accuracy of �0.3 �m or less. Through this selection, Nikon will further improve resolution, precision, and productivity by developing a digital lithography system that achieves resolution of 0.5 �m (L/S), overlay accuracy of �0.15 �m or less, and a 50% reduction in energy consumption compared to conventional systems. *3
- 1 �m (micrometer) is one-millionth of a meter (one-thousandth of a millimeter).
- Abbreviation of line-and-space. Refers to the width of circuit lines and the spacing between adjacent patterns.
- Based on 510�515 mm substrates
- Optical device that displays a circuit pattern instead of a conventional photomask in a maskless exposure system.
- A proportionality constant that determines circuit resolution in the exposure process. A lower value is required to achieve circuit miniaturization.
The information is current as of the date of publication. It is subject to change without notice.
( Press Release Image: https://photos.webwire.com/prmedia/8/363088/363088-1.jpg )
